The Annals of Statistics

Some results on 2nm designs of resolution IV with (weak) minimum aberration

Hegang H. Chen and Ching-Shui Cheng

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It is known that all resolution IV regular 2nm designs of run size N=2nm where 5N/16<n<N/2 must be projections of the maximal even design with N/2 factors and, therefore, are even designs. This paper derives a general and explicit relationship between the wordlength pattern of any even 2nm design and that of its complement in the maximal even design. Using these identities, we identify some (weak) minimum aberration 2nm designs of resolution IV and the structures of their complementary designs. Based on these results, several families of minimum aberration 2nm designs of resolution IV are constructed.

Article information

Ann. Statist., Volume 37, Number 6A (2009), 3600-3615.

First available in Project Euclid: 17 August 2009

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Zentralblatt MATH identifier

Primary: 62K15: Factorial designs

Even design minimum aberration regular fractional factorial design resolution wordlength pattern


Chen, Hegang H.; Cheng, Ching-Shui. Some results on 2 n − m designs of resolution IV with (weak) minimum aberration. Ann. Statist. 37 (2009), no. 6A, 3600--3615. doi:10.1214/08-AOS670.

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