Open Access
December 2009 Some results on 2nm designs of resolution IV with (weak) minimum aberration
Hegang H. Chen, Ching-Shui Cheng
Ann. Statist. 37(6A): 3600-3615 (December 2009). DOI: 10.1214/08-AOS670

Abstract

It is known that all resolution IV regular 2nm designs of run size N=2nm where 5N/16<n<N/2 must be projections of the maximal even design with N/2 factors and, therefore, are even designs. This paper derives a general and explicit relationship between the wordlength pattern of any even 2nm design and that of its complement in the maximal even design. Using these identities, we identify some (weak) minimum aberration 2nm designs of resolution IV and the structures of their complementary designs. Based on these results, several families of minimum aberration 2nm designs of resolution IV are constructed.

Citation

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Hegang H. Chen. Ching-Shui Cheng. "Some results on 2nm designs of resolution IV with (weak) minimum aberration." Ann. Statist. 37 (6A) 3600 - 3615, December 2009. https://doi.org/10.1214/08-AOS670

Information

Published: December 2009
First available in Project Euclid: 17 August 2009

zbMATH: 1369.62184
MathSciNet: MR2549571
Digital Object Identifier: 10.1214/08-AOS670

Subjects:
Primary: 62K15

Keywords: Even design , minimum aberration , regular fractional factorial design , resolution , wordlength pattern

Rights: Copyright © 2009 Institute of Mathematical Statistics

Vol.37 • No. 6A • December 2009
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